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叶超 教授

查看次数:5812

  ,研究员,博士,硕士生导师。

 

1986年毕业于苏州大学物理系;2006年获凝聚态物理博士学位。

主要从事微纳电子薄膜材料,低温等离子体物理、技术与诊断,等离子体与材料相互作用的研究。

主持2国家自然科学基金项目,参加1国家自然科学基金重点项目和1科技部ITER计划国内研究项目研究。Appl Phys Lett物理等学术期刊发表研究论文80多篇。2008年江苏省科技进步三等奖。主编《低气压低温等离子体诊断原理与技术》。

基础物理(实验)国家级教学团队成员,基础物理国家级实验教学中心副主任。获2009年江苏省高等教育教学成果二等奖

 

近期主要论文与论著:

1) Chao Ye, Yijun Xu, Xiaojiang Huang, Zhaoyuan Ning, Effect of high-frequency on etching of SiCOH films in CHF3 dual-frequency capacitively coupled plasmas, Thin Solid Films 518, 3223 (2010)

2) Chao Ye, Haiyan Zhang, Zhaoyuan Ning, Effect of decamethylcyclopentasiloxane and trifluromethane electron cyclotron resonance plasmas on F-SiCOH low dielectric constant film deposition, J.Appl.Phys. 106, 013302 (2009)

3) Chao Ye, Yijun Xu, Xiaojiang Huang, Zhenyu Xing, Jing Yuan, Zhaoyuan Ning, Effect of low-frequency power on etching of SiCOH low-k films in CHF3 13.56MHz/2MHz dual-frequency capacitively coupled plasma, Microelectron. Eng. 86, 421 (2009)

4) Chao Ye, Zhaoyuan Ning, Tingting Wang, Xiaozhu Yu, Yongxia Wei, Xiaomei Qian, Effect of doping on structure and dielectric property of SiCOH films prepared by decamethylcyclopentasiloxane, J Electrochem. Soc. 154, G63 (2007)

5) Chao Ye, Zhaoyuan Ning, Tingting Wang, Xiaozhu Yu, Yu Xin, Effect of Si-OH groups on characteristics of SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma, Thin Solid Films 496, 221 (2006)

6) Chao Ye, Zhaoyuan Ning, Yu Xin, Tingting Wang, Xiaozhu Yu, Meifu Jiang, Optical emission spectroscopy investigation on SiCOH films deposition using decamethylcyclopentasiloxane electron cyclotron resonance plasma, Microelectron. Eng. 82, 35 (2005)

7) 叶超, 宁兆元, 纳电子器件中的超低介电常数材料与多孔SiCOH薄膜研究, 物理 35, 322 (2006)

8) DENG Yan-Hong, YE Chao, YUAN Yuan, LIU Hui-Ming, CUI Jin, Effect of Viscosity of Silicone Oil on Aggregation Behavior of C:F Clusters on a Silicone Oil Liquid Substrate, Chin. Phys. Lett. 28, 046601 (2011)

9) Yuan Yuan, Ye Chao, Huang Hong-Wei, Shi Guo-Feng, Ning Zhao-Yuan, Structural evolution of silicone oil liquid exposed to Ar plasma, Chin. Phys. B 19, 065205 (2010)

10) Jing Yuan, Chao Ye, Zhenyu Xing, Yijun Xu, Zhaoyuan Ning, Reducing Cu diffusion in SiCOH low-k films by O2 plasma treatment, Microelectron. Eng. 86, 2119 (2009)

11) Q. H. Yuan, C. Ye, Y. Xin, X. J. Huang, Z. Y. Ning, G. Q. Yin, Control of the discharge chemistry of CHF3 in dual-frequency capacitively coupled plasmas, Appl. Phys. Lett. 93, 071503 (2008)

12) Zhang Hai-Yan, YE Chao, NING Zhao-Yuan, Mass spectrometry investigation on decamethylcyclopentasiloxane electron cyclotron resonance plasma for SiCOH films deposition, Chin. Phys. Lett. 25, 636 (2008)

13) XU Yi-Jun, YE Chao, HUANG Xiao-Jiang, YUAN Jing, XING Zhen-Yu, NING Zhao-Yuan, Investigation on CHF3 Dual-Frequency Capacitively Coupled Plasma by Optical Emission Spectroscopy, Chin. Phys. Lett. 25, 2942 (2008)

14) Guiqin Yin, Zhaoyuan Ning, Qianghua Yuan, Chao Ye, Yu Xin, Structure characterization of HSQ films for low dielectrics uses D4 as sacrificial porous materials, J. Am. Ceram. Soc. 90, 1943 (2007)

15) Qian Xiao-Mei, Wei Yong-Xia, Yu Xiao-Zhu, Ye Chao, Ning Zhao-Yuan and Liang Rong-Qing, Improvement of electrical properties of Cu/SiCOH low-k films integrated system by O2 plasma treatment, Chin. Phys. 16, 524 (2007)

16) 叶超、宁兆元、江美福、吴雪梅、辛煜编著,《低气压低温等离子体诊断原理与技术》,北京:科学出版社(2010

 

联系方式:

 

Tel: 0512-6915703213913526932

E-mail: cye@suda.edu.cn

 

 

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